Intel taps ASML’s $400M High NA EUV for Panther Lake chips
- Source
- Reuters
- Time
- 7:23 AM
- Weight
- 94/100
Intel has successfully completed the assembly of the semiconductor industry’s first commercial High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography machine at its D1X research facility in Oregon. The Twinscan EXE:5000 system, developed by the Dutch manufacturer ASML, cost approximately $384 million and represents a significant technological leap over standard EUV equipment.
By utilizing a higher numerical aperture, the machine can print features up to 1.7 times smaller, allowing for increased transistor density and improved performance efficiency. The acquisition is a central component of Intel's strategy to regain its manufacturing lead over rivals like TSMC and Samsung.